Full Wafer Ocd Metrology

What does OCD mean in optical modules

Optical critical dimension (OCD) measurement is a technique used in photolithography and etching processes to precisely measure critical dimensions, such as feature sizes and shapes, on semiconductor wafers. Manufacturers now rely on scatterometry for optical critical dimen-sion (OCD) measurements. 1 However, a novel technology combining spectral. While imaging techniques like electron microscopy (CD-SEM) allow for direct visualization without extensive modeling, they are often lacking throughput, full-wafer coverage and tool-to-tool matching in order to be used for Statistical Process Control (SPC).